(UpNano: Vienna) -- A novel device allows the compensation of miniscule roughness in two-photon polymerization (2PP) 3D-printing substrates while printing. The so called “Substrate Tilt Frame” has now been introduced internationally by UpNano GmbH.

The newly developed Substrate Tilt Frame helps to maximize the precision of the print result, especially for large-scale structures.

With NanoOne, entire surfaces of wafers up to 4 in. are accessible for printing.

The Substrate Tilt Frame fits any of UpNano’s NanoOne series of laser-powered 2PP 3D-printing systems, which can build structures across 12 orders of magnitude at an unprecedented speed. Additional developments at UpNano include a fiber holder that allows manufacturing of integrated optical systems on the tip of an optical fiber.

 …