Bede X-ray Metrology, a provider of X-ray metrology solutions to the semiconductor industry, has announced a collaboration with IMEC, a Belgian nanoelectronics and nanotechnology research center.

The companies will investigate the use of X-ray metrology in the process control of new semiconductor materials used at the 45 nm technology node and below, using Bede’s BedeMetrix-L and Microsource with ScribeView optics X-ray system. The BedeMetrix-L uses a combination of high-resolution X-ray diffraction, X-ray diffraction and X-ray reflectivity techniques on a single platform for a wide range of front- and back-end process control applications.

X-ray metrology is an important technology for controlling semiconductor processes as the technology nodes shrink, especially at 45 nm and below.

“Bede X-ray Metrology will be used for the measurement of critical process control parameters needed in the use of advanced semiconductor materials for device fabrication,” says Luc Van den hove, IMEC silicon process and device technology vice president. “We are pleased that our research will benefit from Bede’s expertise in X-ray-based process metrology.”

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