(ZEISS: Oberkochen, Germany) -- At the Microscopy and Microanalysis 2013 meeting in Indianapolis, ZEISS launched the next-generation EVO series for material and life science applications. Customer productivity and imaging performance are dramatically increased by the SEM’s workflow automation, beam deceleration technology, and class-leading HD BSE detector. EVO reduces a typical workflow from over 400 steps to just 15. A user-friendly, mid-column click-stop aperture changer has been introduced for reliable and reproducible results.

EVO allows imaging of exceptionally fine surface details with crisp contrast. Beam-deceleration technology and a high-definition BSE detector provide images rich in topographical information. When combined with EVO HD beam source technology, this ZEISS system sets a new standard in image quality from conventional scanning electron microscopes. , explains, “The customer benefits of the new EVO series are two-fold,” says Allister McBride, director at ZEISS in Cambridge, England. “Automation and intelligent imaging provide increased productivity and intuitive workflows, while beam deceleration and the HD BSE detector offer outstanding topographical and imaging detail at low voltages.”

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