Product News: Metrologic V5 Inspection Solutions in CATIA R19SP3
(Metrologic Group: Wixom, MI) -- The new Metrologic V5 Inspection suite is now available on CATIA V5 R19SP3 level.
(Metrologic Group: Wixom, MI) -- The new Metrologic V5 Inspection suite is now available on CATIA V5 R19SP3 level.
(Sciemetric Instruments: Ottawa) -- Sciemetric Instruments, a provider of manufacturing quality control technology, is pleased to announce the newest addition to the sigPOD family of products.
(Hexagon Metrology: London) -- Hexagon Metrology has filed a patent infringement suit in U.S. District Court in Massachusetts alleging that Metris N.V. and its U.S. subsidiary Metris U.S.A. Inc., and Mitutoyo Corporation and its U.S. subsidiary Mitutoyo America Corporation, have infringed U.S.
(Tohnichi Manufacturing Co.: Northbrook, IL) -- Tohnichi introduces a digital version of its popular TG torque gauge series.
(ASTM International: West Conshohocken, PA) -- Localized corrosion, such as pitting, cracking, or crevice corrosion, can be destructive to process equipment, but if it is detected early enough, potential damage can be minimized or avoided.
The Coordinate Metrology Systems Conference (CMSC) is next week, July 20–24. There is no event in the United States better situated to communicate the value and return on investment of large scale 3-D metrology than the CMSC. This year’s CMSC, its 25th, will be held in Louisville, Kentucky.
(Paul N. Gardner Company Inc.: Pompano Beach, FL) -- The Novo-Gloss I.Q. is the first hand-held instrument to profile how light is reflected from a surface. Traditional glossmeters measure quantitatively and aren't sensitive to effects that reduce appearance quality. The Novo-Gloss I.Q.
(Olympus: Center Valley, Pa.) -- Process engineers, fab managers, professionals in yield enhancement, process development, and failure analysis will benefit from the newly introduced Olympus defect inspection and review system, the company’s fast and accurate semiconductor defect review solution
(Georgia Institute of Technology: Atlanta) -- A new statistical analysis technique that identifies and removes systematic bias, noise, and equipment-based artifacts from experimental data could lead to more precise and reliable measurement of nanomaterials and nanostructures likely to have futur
(UL: Northbrook, IL) -- Underwriters Laboratories (UL), a provider of safety testing and certification, recently announced the completion of its photovoltaic testing facility expansion in San Jose, California.
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