(Renishaw: Gloucestershire, UK) -- Renishaw advances technology in laser interferometer calibration with the “lean design” XL-80 system. The new design allows a 4X faster slew rate and a 10X higher dynamic data capture rate in a smaller, lighter, and more portable package. The XL-80 brings nanometer-level motion analysis to calibration, error-mapping, and compensation of everything from laboratory equipment, semiconductor processing, machinery, and radio surgery tools, to coordinate measuring machines, lithography equipment, advanced machine tools, robots, and assembly systems.

The XL-80 increases linear measurement speed to 4 m/sec while providing a resolution of 1 nanometer, even at top speed. Lightweight, compact packaging enables easier transport and setup, while a 6-minute warm-up minimizes waits to increase available measurement time. A new signal gain switch gives the option of 80 m linear range (such as for large aircraft profilers) or increased signal strength at shorter ranges and a system accuracy of ±0.5 ppm is maintained over the full environmental operating range of temperature, zero to 40°C.

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