(ASM International: Materials Park, OH) — Hillsboro, Oregon-based FEI Co. has released the third generation of its Helios NanoLab DualBeam FIB/SEM microscope, which provides unmatched image contrast and resolution. The new Helios comes in two different workflow-specific configurations for materials science research and has a new easy-to-use interface.

“This third generation of the Helios family continues to provide the high resolution and strong image contrast that the family is known for, but adds a new interface that can actually guide the user through typical operations,” says Trisha Rice, vice president and general manager of materials science for FEI. “We have optimized each of the configurations for a particular class of workflows, based on customer feedback and our long and deep involvement in DualBeam analysis.”

The CX configuration of the Helios NanoLab G3 DualBeam includes more versatile sample handling and positioning for fast, flexible analysis, sample preparation, and characterization.

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