(Gauss Labs: Seoul, South Korea) -- Gauss Labs has released the second version of its AI-based virtual metrology solution, Panoptes VM 2.0.

Panoptes VM provides all-wafer measurement data in real time by predicting process outcomes from sensor data. By applying this solution, it’s possible to predict the process results of all products without physical full-scale measurement, significantly reducing time and resources.

Panoptes VM 2.0 is making a new leap forward with modeling features, including multistep modeling, operation-group modeling, and automatic model selection. With these new features, the prediction accuracy and usability have been greatly improved compared to the previous version.

Gauss launched Panoptes VM 1.0 in November 2022. The system has been deployed to the thin-film deposition process at SK hynix’s high-volume manufacturing fabs since December 2022. By integrating the virtual measurement results from Panoptes VM with APC, SK hynix improved process variability by approximately 29% and also enhanced yield rate.

Thin film deposition: The process of creating and depositing thin film coatings onto a substrate material

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